|Title||Morphology of niobium films sputtered at different sputtering target-substrate angle|
|Type||Poster||materials / surface effects|
|Abstract||The Q-degradation versus accelerating field represents a great limitation for Niobium sputtered electron cavities. Moreover it is well-known that passing to middle beta cavities, by increasing the sputtering target-substrate angle, the Q-slope becomes more and more severe. The authors have investigated the role that such angle has onto film morphology.|
Principle author first.
|Last (Family) Name||First Name (Initials only)||Affiliation or Organization (abbreviations if possible)|