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SRF2003 Show Abstract


Title Morphology of niobium films sputtered at different sputtering target-substrate angle
Type Poster materials / surface effects
Abstract The Q-degradation versus accelerating field represents a great limitation for Niobium sputtered electron cavities. Moreover it is well-known that passing to middle beta cavities, by increasing the sputtering target-substrate angle, the Q-slope becomes more and more severe. The authors have investigated the role that such angle has onto film morphology.

List of authors...

Principle author first.

Last (Family) Name First Name (Initials only) Affiliation or Organization (abbreviations if possible)
Tonini D. INFN-LNL
Greggio C. INFN-LNL
Keppel G. INFN-LNL
Laviano F. Torin Politechnical
Losito R. CERN
Musiani M. CNR-IENI
Torzo G. CNR
Palmieri V CNR-LNL



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