S R F    2 0 0 3

SRF2003 Show Abstract

Title Hydrogen surface analysis of niobium in function of various electrochemical conditions
Type Poster materials / surface effects
Abstract Electropolishing is presently accepted like most efficient surface treatment obtaining high gradients in niobium RF cavities. This treatment seems to introduce more hydrogen in niobium than chemical etching [1]. We shall investigate hydrogen contamination changes in various electrochemical conditions (like anodic protection) during chemical etching and electropolishing, and other conditions like hot water rinsing, hydrofluoric acid rinsing, etc... Hydrogen contamination near the surface is analyzed with HFS (hydrogen forward scattering). This technique allows exploring 200 to 300 nm of the surface (i.e. little bit more than the field penetration depth) and it is used to monitor the hydrogen up-take inside niobium in various electrochemical conditions. [1] Higuchi, T., K. Saito, et al. (2001). 10th Workshop on RF Superconductivity.

List of authors...

Principle author first.

Last (Family) Name First Name (Initials only) Affiliation or Organization (abbreviations if possible)
Antoine C.Z. CEA-Saclay
Berry S. CEA-Saclay
Shou H. CEA-Saclay

SRF 2003Webmaster